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Res Assoc Materials Sci
The CFN is seeking an exceptional postdoctoral researcher to pursue frontier research using novel, self-assembling block copolymer blends to heal irregularities in ultra-high resolution directing chemical patterns, with enormous potential impact in future semiconductor technology fabrication. In this position, you will uncover relationships between pattern-forming kinetics, stochastic defectivity, polymer composition and process design in the lithographically directed self-assembly of polymer thin films. Your project will use innovative blending strategies to uncover fundamental relationships between film composition (polydispersity, chemical mixing, etc.) and dynamic interfacial phenomena in self-assembled nanopatterns. You will also employ cu

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